Effects of anodization and electrodeposition conditions on the growth of copper and cobalt nanostructures in aluminum oxide films - Université de Bretagne Occidentale Access content directly
Journal Articles Journal of Applied Electrochemistry Year : 2009

Effects of anodization and electrodeposition conditions on the growth of copper and cobalt nanostructures in aluminum oxide films

Abstract

Anodic aluminum oxide (AAO) films were prepared by alternative current (ac) oxidation in sulfuric acid and phosphoric acid solution. The porous structure of the AAO templates was probed by ac electrodeposition of copper. AAO templates grown using an applied square waveform signal in cold sulfuric acid solution exhibit a greater pore density and a more homogeneous barrier layer. UV–vis–NIR reflectance spectra of the Cu/AAO assemblies exhibit a plasmon absorption peak centered at 580 nm, consistent with the formation of Cu nanostructures slightly larger than 10 nm in diameter. Spectroscopic data also indicate that there is little or no oxide layer surrounding the Cu nanostructures grown by ac electrodeposition. The effect of pH of the cobalt plating solution on the magnetic properties of the Co/AAO assemblies was also investigated. Co nanowire arrays electrodeposited at pH 5.5 in H2SO4-grown AAO templates exhibit a fair coercivity of 1325 Oe, a magnetization squarness of about 72%, and a significant effective anisotropy.

Dates and versions

hal-01580203 , version 1 (01-09-2017)

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Abbas Ghaddar, Jacek Gieraltowski, Frederic Gloaguen. Effects of anodization and electrodeposition conditions on the growth of copper and cobalt nanostructures in aluminum oxide films. Journal of Applied Electrochemistry, 2009, 39 (5), pp.719 - 725. ⟨10.1007/s10800-008-9715-z⟩. ⟨hal-01580203⟩
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