Effects of anodization and electrodeposition conditions on the growth of copper and cobalt nanostructures in aluminum oxide films

Abbas Ghaddar 1 Jacek Gieraltowski 1 Frederic Gloaguen 2
1 LMB - Laboratoire de magnétisme de Bretagne
2 CEMCA - Chimie, Electrochimie Moléculaires et Chimie Analytique
Abstract : Anodic aluminum oxide (AAO) films were prepared by alternative current (ac) oxidation in sulfuric acid and phosphoric acid solution. The porous structure of the AAO templates was probed by ac electrodeposition of copper. AAO templates grown using an applied square waveform signal in cold sulfuric acid solution exhibit a greater pore density and a more homogeneous barrier layer. UV–vis–NIR reflectance spectra of the Cu/AAO assemblies exhibit a plasmon absorption peak centered at 580 nm, consistent with the formation of Cu nanostructures slightly larger than 10 nm in diameter. Spectroscopic data also indicate that there is little or no oxide layer surrounding the Cu nanostructures grown by ac electrodeposition. The effect of pH of the cobalt plating solution on the magnetic properties of the Co/AAO assemblies was also investigated. Co nanowire arrays electrodeposited at pH 5.5 in H2SO4-grown AAO templates exhibit a fair coercivity of 1325 Oe, a magnetization squarness of about 72%, and a significant effective anisotropy.
Keywords : Aluminum Anodization Cobalt Copper Electrodeposition Nanowire
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Article dans une revue
Journal of Applied Electrochemistry, Springer Verlag, 2009, 39 (5), pp.719 - 725. 〈10.1007/s10800-008-9715-z〉
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http://hal.univ-brest.fr/hal-01580203
Contributeur : Nicolas Renard <>
Soumis le : vendredi 1 septembre 2017 - 10:57:25
Dernière modification le : jeudi 11 janvier 2018 - 06:19:29

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Abbas Ghaddar, Jacek Gieraltowski, Frederic Gloaguen. Effects of anodization and electrodeposition conditions on the growth of copper and cobalt nanostructures in aluminum oxide films. Journal of Applied Electrochemistry, Springer Verlag, 2009, 39 (5), pp.719 - 725. 〈10.1007/s10800-008-9715-z〉. 〈hal-01580203〉

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