Comparison of KTa0.65Nb0.35O3 ferroelectric thin films deposited by chemical solution and pulsed laser: impact on microwave responses - Université de Bretagne Occidentale
Conference Papers Year : 2010

Comparison of KTa0.65Nb0.35O3 ferroelectric thin films deposited by chemical solution and pulsed laser: impact on microwave responses

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Micro and nanotechnologies/Microelectronics

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https://hal.univ-brest.fr/hal-00488794

Submitted on : Wednesday, June 2, 2010-10:07:34 PM

Last modification on : Tuesday, August 27, 2024-12:41:30 PM

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hal-00488794 , version 1 (02-06-2010)

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  • HAL Id : hal-00488794 , version 1

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Ling Yan Zhang, Quentin Simon, Paul Laurent, Noham Martin, Valérie Bouquet, et al.. Comparison of KTa0.65Nb0.35O3 ferroelectric thin films deposited by chemical solution and pulsed laser: impact on microwave responses. 19th International Symposium on the Applications of Ferroelectrics (ISAF), Aug 2010, Edinburgh, United Kingdom. ⟨hal-00488794⟩

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