Comparison of KTa0.65Nb0.35O3 ferroelectric thin films deposited by chemical solution and pulsed laser: impact on microwave responses

Type de document :
Communication dans un congrès
19th International Symposium on the Applications of Ferroelectrics (ISAF), Aug 2010, Edinburgh, United Kingdom. 2010
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http://hal.univ-brest.fr/hal-00488794
Contributeur : Gérard Tanné <>
Soumis le : mercredi 2 juin 2010 - 22:07:34
Dernière modification le : vendredi 25 mai 2018 - 01:26:11

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  • HAL Id : hal-00488794, version 1

Citation

Ling Yan Zhang, Quentin Simon, Paul Laurent, Noham Martin, Valérie Bouquet, et al.. Comparison of KTa0.65Nb0.35O3 ferroelectric thin films deposited by chemical solution and pulsed laser: impact on microwave responses. 19th International Symposium on the Applications of Ferroelectrics (ISAF), Aug 2010, Edinburgh, United Kingdom. 2010. 〈hal-00488794〉

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